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An Advanced Photoresist Exposure System
March 19, 2012 |Estimated reading time: Less than a minute
Maskless Lithography's new exposure unit allows extremely fine line and very fast exposure of dry film photoresist. It is compatible with all standard resists, therefore it is not necessary to use an LDI formulation. Additionally, the well-engineered and solidly built unit makes it suitable for virtually any environment. Maskless Lithography's Global Vice President of Sales and Marketing Rich Chenoweth takes the viewer through a full demonstration of the unit, inside and out.Watch the interview here.